Leak-tight vacuum and process chambers for semiconductor and analytical equipment, machined from aluminium and stainless with weld-ready joints.
Chambers demand controlled surface finish, sealed feature geometry and dimensional stability under vacuum. We produce chamber bodies, lids and flanged sub-parts with flat sealing faces, port bosses and internal features held to tight concentricity.
| Sealing-face flatness | ≤ 0.02 mm |
|---|---|
| Surface finish | Ra 0.4–0.8 µm on seals |
| Concentricity | ≤ 0.03 mm |
| Materials | 6061 / 5083 Al, 316L |